Lithium niobate (LN) is a material very exploited in photonics circuits (optical frequency generators, phase or intensity modulators, quantum states generators…) from labs use to satellites embedded devices. LN thin-films (LNOI) revolutionized integrated optics: by decreasing by several orders of magnitude the control voltage and increasing the modulation rate in intensity modulators, or enhancing frequency generators efficiency. However, the wafers substantial cost, the number and complexity of technological steps for manufacturing circuits, as well as their limited compatibility with standard fiber components (injection losses of several decibels) represent a bottleneck for further development of this technology. In the current project, we propose to combine processes well-known and mastered by the team members to fill the gap between standard photonics chip on bulk LN and LNOI based chips. The goal will be to fabricate a substrate, and components, approaching the outstanding results obtained with LNOI while reducing its fabrication complexity, using low-cost techniques: a layer of increased refractive index will be induced on the surface of a standard LN using a technique perfectioned in INPHYNI since 2013. Several methods of waveguides creation will be implemented: etching of the substrate or of a guiding deposited layer by mechanical or plasma. We will also combine our skills in numerical simulation and technology to keep a high compatibility of the waveguides with fiber-devices. As the originality of the project lies in the compatibility of the processes rather than in their technicality, the risks are low, and for each step we plan several backup solutions in case of failure.