The European microelectronics (ME) industry has a direct impact on approximately 20% of the European GDP and employs over 250,000 people, with more than 64,000 job vacancies. The main technological challenges are 1) to increase both the reliability of the manufactured electronic components and systems (ECS) and sustainability to meet the requirements of the new EU directive Right to Repair, and 2) to reduce the huge product verification effort (70% of total product development time) that represents a substantial burden on costs and resources. To compete with China and North America, the European ME industry is in critical need of cross-discipline experts in electronic manufacturing and digital innovations: software, data and artificial intelligence. The main goal of the MIRELAI industrial doctorate programme is to train the next generation of engineers and scientists for the next generation of reliable and repairable ECS developed within a trustworthy European value chain. The scientific approach is based on three pillars: 1) physics of degradation, 2) multi-scale modeling and 3) AI-based reliability which in sum will add up to a reinvention and new level of efficiency for the ‘design for repair and reliability’ for ECS. Our unique industry-academia partnership of 8 industries, 4 SMEs and 9 research organisations and academic institutions from 7 European countries has all the expertise, experience and capacity along the electronics system value chain to deliver this ambitious research and training programme. Shared hosting and joint supervision by industry and academia of each of the 13 doctoral candidates ensures optimal knowledge transfer. Together, we will pave the way for sustainable, repairable and energy efficient electronic system designs and resource-friendly smart electronics applications. MIRELAI is thus perfectly aligned with the European research agenda and the EU Pact for Skills, a shared engagement model for skills development in Europe.

The overall objective of the PIn3S project is to realize Pilot Integration of 3nm Semiconductor technology. This covers Process Integration, creation of Lithography Equipment, EUV Mask Repair Equipment and Metrology tools capable to deal with 3D structures, defects analysis, overlay and feature size evaluation. Each of these objectives will be achieved by cooperation between key European equipment developers like; ASML, Zeiss, Thermo Fisher, Applied Materials, Nova, KTI involved with their suppliers, involvement of a strong knowledge network based on Universities of Germany, Heidelberg University Hospital, and the Netherland, TU Delft and the University of Twente, complemented with key Technology Institutes such as imec and Fraunhofer. The project addresses Section 15 “Electronics Components & Systems Process Technology, Equipment, Materials and Manufacturing”, Major Challenge 4 “Maintaining world leadership in Semiconductor Equipment, Materials and Manufacturing solutions” and Major Challenge 1 “Developing advanced logic and memory technology for nanoscale integration and application-driven performance” of the ECSEL JU Annual Work Plan 2018. As set out in the Multi Annual Strategic Plan 2018, PIn3S addresses the ambition for the European Equipment & Manufacturing industry for advanced semiconductor technologies to lead the world in miniaturization by supplying new equipment and materials approximately two years ahead of introduction of volume production of advanced semiconductor manufacturers. With the results of the Pin3S project the consortium builds on realizing IC manufacturers to migrate to the 3nm Technology node which enables a class of new products which have more functionality, more performance and are more power efficient. As such it will form the bases for innovations yet to come enabling solutions that address the societal challenges in communication, mobility, health care, security, energy and safety & security.

The 14AMI project is about creating technological solutions for the 14 Angstrom CMOS technology node, including a fully integrated functional CFET (Complementary Field Effect Transistor) as new active CMOS device, and state-of-the-art holistic metrology techniques for both wafer and mask inspection and review. All is aimed to keep the pace in the industry to follow “Moore’s law”. The project addresses the following 3 main pillars that are relevant in enabling manufacture of 14A technology, 1) lithography, 2) metrology and 3) process module integration. In lithography the aim is to realize solutions for the 0.55NA EUV scanner platform to secure 14Angstrom node compliance in performance, that is, resolution, alignment, throughput and optics lifetime. In Metrology the objective is to cover wafer and mask metrology and quality control. The aim is to develop holistic metrology, tools & methods and data analytics to improve overlay, CD and focus measurement and quality control with a Precision to Tolerance, P/T, ratio between 0.1 and 0.3. In process module integration work covers the realization and demonstration of a CFET – Complementary Field Effect Transistor - CMOS device. Three options will be investigated for integration; a monolithic, sequential and a hybrid solution. In addition, the partners will develop a PFAS-free photo resist to reduce the ecological footprint of photolithography processes, and a smart AI based sensor technology to improve vacuum chambers' efficiency and reduce waste. At societal level the expected impact of the 14AMI project will support the partners and their supplier network to stay at the leading edge of high-tech developments, crucial to meet the digitization challenges of the European society. Moreover, 14AMI will “boost industrial competitiveness”, and attract talent in Europe, while enabling new application in areas such as security, communication and enabling of further automation in mobility, health and research.